Chemraz® 663, a perfluoroelastomer (FFKM), is engineered to withstand low-temperature Etch and Deposition applications where plasma resistance and the ability to maintain sealing force in a vacuum are critical, such as electrostatic chuck assemblies.
Note: Due to the nature of the material, slight variations in this color may exist in Chemraz® 663. Darker or lighter areas may also be present on the parts. These natural variations should be considered cosmetic, and will not affect the performance of the parts.
Provides enhanced plasma resistance in low-temperature Etch and Deposition environments