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Chemraz® 547

Exceptional Fluorine Plasma Resistance

ENHANCED PERFORMANCE IN AGGRESSIVE ENVIRONMENTS

Chemraz® 547 is a perfluoroelastomer specifically developed by Greene, Tweed to meet the rigorous demands of aggressive plasma systems. This product’s unique formulation provides enhanced plasma resistance in fluorine plasma processes resulting in less downtime and higher wafer processing yields. This novel formulation delivers elemental purity, without fillers, to reduce contamination risk. Chemraz 547 is recommended for both dynamic and static, dry wafer processing applications such as deposition (PECVD, HDPCVD, etc.) and remote plasma cleans. Chemraz 547 remains stable at service temperatures up to 300°C (572°F).

Features & Benefits

  • Exceptional plasma resistance in fluorine environments
  • Minimal particulation and surface degradation
  • High purity, very low metallic ion content
  • Excellent compression set for repeated use

APPLICATIONS

  • Lid seals
  • Endpoint windows
  • Gas inlet/outlet seals
  • Chamber seals
  • Valve seals
  • Slit valve seals
  • Isolation valve seals
  • Gasket seals
  • Dispersing seals
  • Regulator seals
  • Filler seals

RECOMMENDED PROCESS APPLICATIONS

  • Deposition (PEALD, PECVD, RPCVD, HDPCVD, APCVD, SACVD, DCVD)
  • RTP/Diffusion
  • Remote plasma cleans

 

 

Collaborative innovation from GREENE, TWEED & CO., INC., and DAIKIN INDUSTRIES, LTD.



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