SEALING SOLUTIONS

Chemraz® 520 is recommended for a wide variety of semiconductor equipment dry processing applications where seal reliability with minimal contamination is required. Additionally, Chemraz® 520 offers excellent performance history in static and dynamic plasma and diffusion processes as well as static photolithography processes. Chemraz® 520 is formulated for use in high sealing load applications and where temperatures do not exceed 240ºC (464°F). Due to the hardness of this material, low-temperature applications may require smoother hardware surface finishes of 10 microinches (Ra) and below.

Features & Benefits

  • Excellent plasma resistance
  • Outstanding physical properties
  • Low contaminants
  • Withstands higher sealing loads
  • Excellent performance history in higher temperature applications

APPLICATIONS

  • Door seals
  • Slit valves
  • Isolator valve seals
  • Lid seals
  • Gas inlet seals
  • KF fitting seals
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RECOMMENDED PROCESS APPLICATIONS

  • Metalization (CVD, PVD, sputtering, evaporation)
  • Deposition (CVD, PECVD, RPCVD, HDPCVD, APCVD, SACVD, DCVD)
  • Dry plasma etch
  • Remote plasma cleans
  • Dry ashing
  • Oxidation (LPCVD)/Diffusion
  • Implant anneal
  • Rapid thermal processing (RTP)


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