With its broad chemical resistance, Chemraz® 551 is ideally suited as a universal sealing material for aqueous semiconductor wafer processing and chemical/DI water distribution systems. Chemraz® 551 provides a significantly wider operational band and superior compression set resistance than any other broad range perfluoroelastomer (FFKM) on the market. With an upper temperature limit of 316ºC (600ºF), it is the elastomer of choice for the most demanding applications from Ozonated DI water to Hot Sulfuric Resist Strip.
Chemraz® 551 is one of Greene, Tweed’s many cost-effective products and services that increase the reliability and extend the lifetime of our customers’ equipment in challenging aqueous conditions while protecting both the operator and the environment from harmful fluid leaks.
Wet etch (oxide, nitride, metal) Wet photoresist strip (acid, solvent) Wet cleaning (batch and single wafer) Photolithography track pre-cleaning Electrochemical Plating