SEALING SOLUTIONS

Chemraz® E38 was specifically developed for high-density plasma systems and diffusion processes where seal reliability and very minimal contamination are essential. The material provides excellent chemical compatibility and withstands a variety of aggressive chemicals. Available in an infinite range of geometries and cross sections, this material offers the diversity required for a variety of dynamic or static dry processing applications. Recommended for slit valves, Chemraz® E38 remains stable at service temperatures as high as 260ºC (500°F) where high sealing loads are not used.

Features & Benefits

  • Minimal contamination
  • Withstands a variety of aggressive chemicals
  • Excellent physical properties
  • Low metal ion content
  • Unlimited design flexibility

APPLICATIONS

  • Bonded gate seals
  • Chamber seals
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RECOMMENDED PROCESS APPLICATIONS

  • Deposition (CVD, PECVD, RPCVD, HDPCVD, APCVD, SACVD, DCVD)
  • Remote plasma cleans
  • Oxidation (LPCVD)
  • Diffusion
  • Metalization (CVD, PVD, sputtering, evaporation)
  • Dry plasma etch
  • Dry ashing
  • Ion implant
  • Implant anneal
  • Rapid thermal processing (RTP)


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