Product Details

Chemraz G57

Increase Uptime and Processing Yields

Do you need custom-engineered wafer processing seals that meet the demands of aggressive dry plasma systems? Chemraz® G57’s unique formulation provides improved plasma resistance and minimizes contamination, resulting in less downtime and higher wafer processing yields in both static and dynamic applications.

Chemraz® G57 is an FFKM compound with high temperature capability and excellent O2 plasma compatibility, boasting excellent chemical resistance and maximum temperature operation to 572°F (300°C).

Chemraz G57

Features and Benefits

  • Excellent plasma resistance in a variety of aggressive chemical environments
  • High service temperatures up to 572°F / 300°C
  • Minimal particulation
  • Lower hardness for easy installation
  • Lower sticking properties for dynamic applications
  • Available as O-ring, custom CXs, and slabs – with no restrictions on availability
  • Global manufacturing capabilities

Industries & Applications

Chemraz G57

A high-performance elastomer designed for demanding applications

Chemraz® G57 products are designed for use across a wide range of applications. No matter how demanding the environment, our team works with you to determine the right solution for the job.

Applications include:

  • Endpoint windows
  • Seals
  • Dy plasma etch
  • Deposition
  • Remote plasma cleans
  • Dry ashing
  • Oxidation
  • Diffusion
  • Metalization
Chemraz G57

Reliable Performance

Chemraz® G57 is a proven, reliable engineered component solution. It is available in the form of O-rings, custom CXs, and slabs.

Enhanced Plasma Resistance